Oxide ceramic sputtering targets are one of the most common among advanced ceramic sputtering targets. Oxide ceramics can be made by sintering at high temperatures, with one or more oxides as major components and other minor oxides as additives. These are divided into simple oxide ceramics and complex oxide ceramics. We supply high-quality Al2O3, SiO2, Nb2Ox, TiOx, ITO, AZO, YSZ, IGZO, and other sputtering targets.

To provide a complete solution, oxygen free copper backing plate and Indium bonding services are available for each oxide ceramic sputtering target.

List of few Oxide Sputtering Targets

Aluminum Oxide (Al₂O₃), Antimony Oxide (Sb₂O₃), Barium Titanate (BaTiO₃), Bismuth Oxide (Bi₂O₃), Cerium Oxide (CeO₂), Copper Oxide (CuO), Chromium Oxide (Cr₂O₃), Dysprosium Oxide (Dy₂O₃), Erbium Oxide (Er₂O₃), Europium Oxide (Eu₂O₃), Gadolinium Oxide (Gd₂O₃), Gallium Oxide (Ga₂O₃), Hafnium Oxide (HfO₂), Indium Oxide (In₂O₃), Indium Tin Oxide (ITO- In2O3/SnO2), Iron Oxide (Fe₂O₃), Iron Oxide (Fe₃O₄), Lead Titanate (PbTiO₃), Lead Zirconate (PbZrO₃), Lutetium Oxide (Lu₂O₃), Magnesium Oxide (MgO), Molybdenum Oxide (MoO₃), Neodymium Oxide (Nd₂O₃), Silicon Dioxide (SiO₂), Silicon Monoxide (SiO), Strontium Titanate (SrTiO₃), Tantalum Pentoxide (Ta₂O₅), Titanium Dioxide (TiO₂), Titanium Monoxide (TiO), Titanium Oxide (Ti₃O₅), Tin Oxide (SnO₂) and Tungsten Oxide (WO₃).