Silicon on insulator wafers are most common in micro-electromechanical systems (MEMS) and advanced complementary metal-oxide-semiconductor (CMOS) integrated circuit fabrication, and can improve many of the processes that more traditional silicon wafers are used in. These wafers provide a manufacturing solution which helps reduce power and heat while increasing the speed performance of a device. SOI wafers are a three layer material stack composed of the following: an active layer of prime quality silicon (device layer) over a buried oxide layer (box) of electrically insulating silicon dioxide (SiO₂) over a bulk silicon support wafer (handle). SOI wafers are unique products for specific end-user applications.